Comparative study of monolithic, bilayer and gradient CVD diamond coatings under dry sliding against alumina

Xehetasun bibliografikoak
Parent link:Ceramics International.— .— Amsterdam: Elsevier Science Publishing Company Inc.
Vol. 51, iss. 29, pt. B.— 2025.— P. 61338-61346
Beste egile batzuk: Gaydaychuk A. V. Alexander Valerievich, Mitulinsky A. S. Aleksandr Sergeevich, Zenkin S. P. Sergey Petrovich, Linnik S. A. Stepan Andreevich
Gaia:Title screen
Tribological performance of chemical vapor deposition (CVD) diamond coatings with different internal architectures – monolithic microcrystalline (M), nanocrystalline (N), bilayer (2L), and gradient structures (G4, G8, G12) – was evaluated under dry sliding against alumina. Gradient coatings with varied microcrystalline base thicknesses were prepared to clarify the influence of structural transitions on friction, wear, and adhesion. Coating architecture was found to play a decisive role in controlling tribological behavior. The gradient coating with the thickest microcrystalline base (G4) exhibited stable low friction and strong adhesion, whereas thinner gradients (G8, G12) and the bilayer (2L) showed unstable friction and higher wear, attributed to increased sp2 content and abrupt interfaces. The nanocrystalline coating demonstrated stable but higher friction, while the microcrystalline coating combined low wear with limited interfacial strength. Raman spectroscopy and post-test microscopy confirmed that the sp3/sp2 carbon phase balance and the presence of a continuous structural gradient govern crack propagation, debris formation, and friction stability. Overall, a graded architecture with a sufficiently thick microcrystalline base provides an effective design route for achieving mechanically robust, wear-resistant, and low-friction diamond coatings suitable for advanced tribological applications
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AM_Agreement
Argitaratua: 2025
Gaiak:
Sarrera elektronikoa:https://doi.org/10.1016/j.ceramint.2025.10.328
Formatua: Baliabide elektronikoa Liburu kapitulua
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=684119