Numerical Simulation of Thermal Processes and Influence of Heating Surface Layers of Silicon on the Titanium Accumulation and Diffusion During High-Intensity Pulse Ion Implantation; Energy Fluxes and Radiation Effects (EFRE-2024)

Numerical Simulation of Thermal Processes and Influence of Heating Surface Layers of Silicon on the Titanium Accumulation and Diffusion During High-Intensity Pulse Ion Implantation; Energy Fluxes and Radiation Effects (EFRE-2024)

التفاصيل البيبلوغرافية
Parent link:	Energy Fluxes and Radiation Effects (EFRE-2024).— 2024.— P. 322
المؤلف الرئيسي:	Ivanova A. I. Anna Ivanovna
مؤلفون آخرون:	Bleykher (Bleicher) G. A. Galina Alekseevna, Zaytsev Daniil Dmitrievich D. D.
الملخص:	Текстовый файл
اللغة:	الإنجليزية
منشور في:	2024
الموضوعات:	электронный ресурс труды учёных ТПУ
الوصول للمادة أونلاين:	https://efre.ru/download/EFRE-2024-Abstracts.pdf#page=322 Статья на русском языке
التنسيق:	الكتروني فصل الكتاب
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=678377

مواد مشابهة

Study of Regularities of Titanium Accumulation and Diffusion in Silicon During Repetitively-Pulsed Implantation with a High-Intense Ion Beam; Energy Fluxes and Radiation Effects (EFRE-2024)
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Numerical Modeling of Thermal Processes and the Effect of Heating of Near-Surface Silicon Layers on the Titanium Accumulation and Diffusion during High-Intensity Pulsed Ion Implantation; Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques; Vol. 19, iss. 4
حسب: Ivanova A. I. Anna Ivanovna
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Numerical Simulation of Thermal Processes and the Effect of Heating of Near-Surface Layers of Titanium on the Diffusion Transfer of Dopants during High-Intensity Pulsed Ion Implantation; Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques; Vol. 17, iss. 6
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