Numerical Simulation of Thermal Processes and Influence of Heating Surface Layers of Silicon on the Titanium Accumulation and Diffusion During High-Intensity Pulse Ion Implantation

مواد مشابهة

• Numerical Simulation of Thermal Processes and the Effect of Heating of Near-Surface Layers of Titanium on the Diffusion Transfer of Dopants during High-Intensity Pulsed Ion Implantation
  حسب: Ivanova A. I. Anna Ivanovna
  منشور في: (2023)
• Study of Regularities of Titanium Accumulation and Diffusion in Silicon During Repetitively-Pulsed Implantation with a High-Intense Ion Beam
  منشور في: (2024)
• Features of thermal processes and the influence of pulsed heating of surface layers of titanium on the diffusion transfer of dopants during high-intensity ion implantation
  حسب: Gurulev A. V. Aleksandr Valerjevich
  منشور في: (2023)
• High Intensity Implantation of Aluminium Ions into Titanium
  منشور في: (2004)
• The high intensity implantation of aluminium ions into titanium
  منشور في: (2004)