Study of Regularities of Titanium Accumulation and Diffusion in Silicon During Repetitively-Pulsed Implantation with a High-Intense Ion Beam

Study of Regularities of Titanium Accumulation and Diffusion in Silicon During Repetitively-Pulsed Implantation with a High-Intense Ion Beam

Podrobná bibliografie
Parent link:	Energy Fluxes and Radiation Effects (EFRE-2024): Abstracts of 9th International Congress, Tomsk, September 16-21, 2024. P. 321.— .— Tomsk: Academizdat Publishing, 2024.— https://efre.ru/abstracts?ysclid=m3zkkvf041603477442
Další autoři:	Ivanova A. I. Anna Ivanovna, Korneva O. S. Olga Sergeevna, Gurulev A. V. Aleksandr Valerjevich, Zaytsev Daniil Dmitrievich D. D., Merzlyakov I. Ivan
Shrnutí:	Текстовый файл
Vydáno:	2024
Témata:	электронный ресурс труды учёных ТПУ
On-line přístup:	https://efre.ru/download/EFRE-2024-Abstracts.pdf#page=321 Статья на русском языке
Médium:	Elektronický zdroj Kapitola
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=678365

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