Study of Regularities of Titanium Accumulation and Diffusion in Silicon During Repetitively-Pulsed Implantation with a High-Intense Ion Beam; Energy Fluxes and Radiation Effects (EFRE-2024)

Study of Regularities of Titanium Accumulation and Diffusion in Silicon During Repetitively-Pulsed Implantation with a High-Intense Ion Beam; Energy Fluxes and Radiation Effects (EFRE-2024)

Bibliografske podrobnosti
Parent link:	Energy Fluxes and Radiation Effects (EFRE-2024).— 2024.— P. 321
Drugi avtorji:	Ivanova A. I. Anna Ivanovna, Korneva O. S. Olga Sergeevna, Gurulev A. V. Aleksandr Valerjevich, Zaytsev Daniil Dmitrievich D. D., Merzlyakov I. Ivan
Izvleček:	Текстовый файл
Jezik:	angleščina
Izdano:	2024
Teme:	электронный ресурс труды учёных ТПУ
Online dostop:	https://efre.ru/download/EFRE-2024-Abstracts.pdf#page=321 Статья на русском языке
Format:	Elektronski Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=678365

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