Study of Regularities of Titanium Accumulation and Diffusion in Silicon During Repetitively-Pulsed Implantation with a High-Intense Ion Beam; Energy Fluxes and Radiation Effects (EFRE-2024)

Gelijkaardige items

• Numerical Simulation of Thermal Processes and Influence of Heating Surface Layers of Silicon on the Titanium Accumulation and Diffusion During High-Intensity Pulse Ion Implantation; Energy Fluxes and Radiation Effects (EFRE-2024)
  door: Ivanova A. I. Anna Ivanovna
  Gepubliceerd in: (2024)
• Numerical Modeling of Thermal Processes and the Effect of Heating of Near-Surface Silicon Layers on the Titanium Accumulation and Diffusion during High-Intensity Pulsed Ion Implantation; Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques; Vol. 19, iss. 4
  door: Ivanova A. I. Anna Ivanovna
  Gepubliceerd in: (2025)
• High-intensity implantation of titanium into silicon using repetitively pulsed high-density beams; European Physical Journal Plus; Vol. 140
  Gepubliceerd in: (2025)
• Investigation of Regularities of High-Intensity Ion Implantation in Combination with Subsequent Exposure to the Surface of a High-Current Electron Beam; Energy Fluxes and Radiation Effects (EFRE-2020 online)
  Gepubliceerd in: (2020)
• High Intensity low Aluminum Ion Energy Implantation into Titanium; Ion Implantation Technology (IIT 2018)
  Gepubliceerd in: (2018)