Investigation of the Features of High-Intensity Implantation of Nitrogen Ions into Titanium; Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques; Vol. 17, s. 1

Bibliographic Details
Parent link:Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques.— .— New York: Springer Science+Business Media LLC
Vol. 17, s. 1.— 2023.— P. S162–S165
Corporate Author: National Research Tomsk Polytechnic University (570)
Other Authors: Ryabchikov A. I. Aleksandr Ilyich, Korneva O. S. Olga Sergeevna, Ivanova A. I. Anna Ivanovna, Varlachev V. A. Valery Aleksandrovich, Chernyshev A. A.
Summary:Title screen
The article presents the results of studies of the features and regularities of high-intensity nitrogen ion implantation into titanium using repetitively-pulsed beams with high average power densities. It is shown that the method of low-energy high-intensity nitrogen ion implantation at current densities of 180, 140, 60, and 10 mA/cm2 makes it possible to obtain wide ion-doped layers in titanium. The regularities of changes in both thickness and elemental composition of ion-doped layers depending on the ion current density have been established. It has been established that a wide diffusion layer is observed at ion current densities from 60 to 180 mA/cm2. Nitrogen concentration in the diffusion layer increases with an increase in the ion current density. The article presents the transmission electron microscopy data showing that the modified layers at a depth of 10 μm consist of α-Ti, in the volume of which nanosized particles of δ-TiN with average size of 15.4 nm crystallize
Текстовый файл
AM_Agreement
Language:English
Published: 2023
Subjects:
Online Access:https://doi.org/10.1134/S1027451023070455
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=675349

MARC

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330 |a The article presents the results of studies of the features and regularities of high-intensity nitrogen ion implantation into titanium using repetitively-pulsed beams with high average power densities. It is shown that the method of low-energy high-intensity nitrogen ion implantation at current densities of 180, 140, 60, and 10 mA/cm2 makes it possible to obtain wide ion-doped layers in titanium. The regularities of changes in both thickness and elemental composition of ion-doped layers depending on the ion current density have been established. It has been established that a wide diffusion layer is observed at ion current densities from 60 to 180 mA/cm2. Nitrogen concentration in the diffusion layer increases with an increase in the ion current density. The article presents the transmission electron microscopy data showing that the modified layers at a depth of 10 μm consist of α-Ti, in the volume of which nanosized particles of δ-TiN with average size of 15.4 nm crystallize 
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461 1 |t Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques  |c New York  |n Springer Science+Business Media LLC 
463 1 |t Vol. 17, s. 1  |v P. S162–S165  |d 2023 
610 1 |a электронный ресурс 
610 1 |a труды учёных ТПУ 
610 1 |a ion beam 
610 1 |a dopants 
610 1 |a implantation 
610 1 |a high intensity 
610 1 |a repetitively pulsed 
610 1 |a surface modification 
610 1 |a titanium 
610 1 |a nitrogen ions 
610 1 |a radiation enhanced diffusion 
610 1 |a wide ion-doped layers 
701 1 |a Ryabchikov  |b A. I.  |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences  |c physicist  |f 1950-  |g Aleksandr Ilyich  |9 15150 
701 1 |a Korneva  |b O. S.  |c physicist  |c engineer of Tomsk Polytechnic University  |f 1988-  |g Olga Sergeevna  |9 20156 
701 1 |a Ivanova  |b A. I.  |c physicist  |c Associate Scientist of Tomsk Polytechnic University  |f 1987-  |g Anna Ivanovna  |9 20002 
701 1 |a Varlachev  |b V. A.  |c physicist, specialist in the field of nuclear physics  |c Professor-consultant of Tomsk Polytechnic University, Doctor of Technical Sciences  |f 1948-  |g Valery Aleksandrovich  |y Tomsk  |9 17353 
701 1 |a Chernyshev  |b A. A. 
712 0 2 |a National Research Tomsk Polytechnic University  |c (2009- )  |9 27197  |4 570 
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