Investigation of the Features of High-Intensity Implantation of Nitrogen Ions into Titanium
| Parent link: | Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques.— .— New York: Springer Science+Business Media LLC Vol. 17, s. 1.— 2023.— P. S162–S165 |
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| Altres autors: | , , , , |
| Sumari: | Title screen The article presents the results of studies of the features and regularities of high-intensity nitrogen ion implantation into titanium using repetitively-pulsed beams with high average power densities. It is shown that the method of low-energy high-intensity nitrogen ion implantation at current densities of 180, 140, 60, and 10 mA/cm2 makes it possible to obtain wide ion-doped layers in titanium. The regularities of changes in both thickness and elemental composition of ion-doped layers depending on the ion current density have been established. It has been established that a wide diffusion layer is observed at ion current densities from 60 to 180 mA/cm2. Nitrogen concentration in the diffusion layer increases with an increase in the ion current density. The article presents the transmission electron microscopy data showing that the modified layers at a depth of 10 μm consist of α-Ti, in the volume of which nanosized particles of δ-TiN with average size of 15.4 nm crystallize Текстовый файл AM_Agreement |
| Idioma: | anglès |
| Publicat: |
2023
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| Matèries: | |
| Accés en línia: | https://doi.org/10.1134/S1027451023070455 |
| Format: | Electrònic Capítol de llibre |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=675349 |