Radioactivation Monitoring of the Density of Wear-Resistant AlN and CrN Coatings on Silicon; Technical Physics Letters; Vol. 47, iss. 7

Radioactivation Monitoring of the Density of Wear-Resistant AlN and CrN Coatings on Silicon; Technical Physics Letters; Vol. 47, iss. 7

Dettagli Bibliografici
Parent link:	Technical Physics Letters Vol. 47, iss. 7.— 2021.— [P. 524-527]
Enti autori:	Национальный исследовательский Томский политехнический университет Исследовательская школа физики высокоэнергетических процессов, Национальный исследовательский Томский политехнический университет Инженерная школа новых производственных технологий Научно-производственная лаборатория "Импульсно-пучковых, электроразрядных и плазменных технологий"
Altri autori:	Ryzhkov V. A. Vladislav Andreevich, Tarbokov V. A. Vladislav Aleksandrovich, Smolyansky E. A. Egor Aleksandrovich, Remnev G. E. Gennady Efimovich
Riassunto:	Title screen A combination of two methods (nondestructive proton beam radioactivation analysis and optical microinterferometry) has been used for measuring the mass and linear thicknesses of AlN and CrN coatings deposited onto silicon substrates by means of magnetron sputtering. It is established that, at linear thickness from 2.2 to 5.7 μm, the density of deposits is close to that of bulk materials (3.26 g/cm3 for AlN and 5.9 g/cm3 for CrN), while the stoichiometry of nitrides can be controlled by varying the parameters of magnetron sputtering. The proposed method can also be used for determining the densities of metal carbide and oxide films used as wear-resistant coatings. Режим доступа: по договору с организацией-держателем ресурса
Lingua:	inglese
Pubblicazione:	2021
Soggetti:	электронный ресурс труды учёных ТПУ density radioactivation analysis magnetron microinterferometer плотность радиоактивный анализ магнетроны износостойкие покрытия
Accesso online:	https://doi.org/10.1134/S106378502105028X
Natura:	Elettronico Capitolo di libro
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=667310

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