Radioactivation Monitoring of the Density of Wear-Resistant AlN and CrN Coatings on Silicon; Technical Physics Letters; Vol. 47, iss. 7
| Parent link: | Technical Physics Letters Vol. 47, iss. 7.— 2021.— [P. 524-527] |
|---|---|
| Yhteisötekijät: | , |
| Muut tekijät: | , , , |
| Yhteenveto: | Title screen A combination of two methods (nondestructive proton beam radioactivation analysis and optical microinterferometry) has been used for measuring the mass and linear thicknesses of AlN and CrN coatings deposited onto silicon substrates by means of magnetron sputtering. It is established that, at linear thickness from 2.2 to 5.7 μm, the density of deposits is close to that of bulk materials (3.26 g/cm3 for AlN and 5.9 g/cm3 for CrN), while the stoichiometry of nitrides can be controlled by varying the parameters of magnetron sputtering. The proposed method can also be used for determining the densities of metal carbide and oxide films used as wear-resistant coatings. Режим доступа: по договору с организацией-держателем ресурса |
| Kieli: | englanti |
| Julkaistu: |
2021
|
| Aiheet: | |
| Linkit: | https://doi.org/10.1134/S106378502105028X |
| Aineistotyyppi: | xMaterials Elektroninen Kirjan osa |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=667310 |
MARC
| LEADER | 00000naa0a2200000 4500 | ||
|---|---|---|---|
| 001 | 667310 | ||
| 005 | 20250310143832.0 | ||
| 035 | |a (RuTPU)RU\TPU\network\38515 | ||
| 035 | |a RU\TPU\network\37711 | ||
| 090 | |a 667310 | ||
| 100 | |a 20220315d2021 k||y0rusy50 ba | ||
| 101 | 0 | |a eng | |
| 135 | |a drgn ---uucaa | ||
| 181 | 0 | |a i | |
| 182 | 0 | |a b | |
| 200 | 1 | |a Radioactivation Monitoring of the Density of Wear-Resistant AlN and CrN Coatings on Silicon |f V. A. Ryzhkov, V. A. Tarbokov, E. A. Smolyansky, G. E. Remnev | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 5 tit.] | ||
| 330 | |a A combination of two methods (nondestructive proton beam radioactivation analysis and optical microinterferometry) has been used for measuring the mass and linear thicknesses of AlN and CrN coatings deposited onto silicon substrates by means of magnetron sputtering. It is established that, at linear thickness from 2.2 to 5.7 μm, the density of deposits is close to that of bulk materials (3.26 g/cm3 for AlN and 5.9 g/cm3 for CrN), while the stoichiometry of nitrides can be controlled by varying the parameters of magnetron sputtering. The proposed method can also be used for determining the densities of metal carbide and oxide films used as wear-resistant coatings. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 338 | |b Российский фонд фундаментальных исследований |d 20-21-00025/20 | ||
| 461 | |t Technical Physics Letters | ||
| 463 | |t Vol. 47, iss. 7 |v [P. 524-527] |d 2021 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a density | |
| 610 | 1 | |a radioactivation analysis | |
| 610 | 1 | |a magnetron | |
| 610 | 1 | |a microinterferometer | |
| 610 | 1 | |a плотность | |
| 610 | 1 | |a радиоактивный анализ | |
| 610 | 1 | |a магнетроны | |
| 610 | 1 | |a износостойкие покрытия | |
| 701 | 1 | |a Ryzhkov |b V. A. |c specialist in nuclear physics |c Senior Researcher, Tomsk Polytechnic University, Candidate of Physical and Mathematical Sciences |f 1958- |g Vladislav Andreevich |3 (RuTPU)RU\TPU\pers\44020 | |
| 701 | 1 | |a Tarbokov |b V. A. |c specialist in the field of material science |c Leading engineer of Tomsk Polytechnic University, Candidate of technical sciences |f 1969- |g Vladislav Aleksandrovich |3 (RuTPU)RU\TPU\pers\41878 | |
| 701 | 1 | |a Smolyansky |b E. A. |c Physicist |c Research Engineer of Tomsk Polytechnic University |f 1985- |g Egor Aleksandrovich |3 (RuTPU)RU\TPU\pers\37673 | |
| 701 | 1 | |a Remnev |b G. E. |c physicist |c Professor of Tomsk Polytechnic University, Doctor of technical sciences |f 1948- |g Gennady Efimovich |3 (RuTPU)RU\TPU\pers\31500 | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Исследовательская школа физики высокоэнергетических процессов |c (2017- ) |3 (RuTPU)RU\TPU\col\23551 |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Инженерная школа новых производственных технологий |b Научно-производственная лаборатория "Импульсно-пучковых, электроразрядных и плазменных технологий" |3 (RuTPU)RU\TPU\col\23502 |
| 801 | 2 | |a RU |b 63413507 |c 20220315 |g RCR | |
| 856 | 4 | |u https://doi.org/10.1134/S106378502105028X | |
| 942 | |c CF | ||