Radioactivation Monitoring of the Density of Wear-Resistant AlN and CrN Coatings on Silicon; Technical Physics Letters; Vol. 47, iss. 7

Radioactivation Monitoring of the Density of Wear-Resistant AlN and CrN Coatings on Silicon; Technical Physics Letters; Vol. 47, iss. 7

Detalles Bibliográficos
Parent link:Technical Physics Letters
Vol. 47, iss. 7.— 2021.— [P. 524-527]
Corporate Authors: Национальный исследовательский Томский политехнический университет Исследовательская школа физики высокоэнергетических процессов, Национальный исследовательский Томский политехнический университет Инженерная школа новых производственных технологий Научно-производственная лаборатория "Импульсно-пучковых, электроразрядных и плазменных технологий"
Outros autores: Ryzhkov V. A. Vladislav Andreevich, Tarbokov V. A. Vladislav Aleksandrovich, Smolyansky E. A. Egor Aleksandrovich, Remnev G. E. Gennady Efimovich
Summary:Title screen
A combination of two methods (nondestructive proton beam radioactivation analysis and optical microinterferometry) has been used for measuring the mass and linear thicknesses of AlN and CrN coatings deposited onto silicon substrates by means of magnetron sputtering. It is established that, at linear thickness from 2.2 to 5.7 μm, the density of deposits is close to that of bulk materials (3.26 g/cm3 for AlN and 5.9 g/cm3 for CrN), while the stoichiometry of nitrides can be controlled by varying the parameters of magnetron sputtering. The proposed method can also be used for determining the densities of metal carbide and oxide films used as wear-resistant coatings.
Режим доступа: по договору с организацией-держателем ресурса
Idioma:inglés
Publicado: 2021
Subjects:
электронный ресурс
труды учёных ТПУ
density
radioactivation analysis
magnetron
microinterferometer
плотность
радиоактивный анализ
магнетроны
износостойкие покрытия
Acceso en liña:https://doi.org/10.1134/S106378502105028X
Formato: Electrónico Capítulo de libro
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=667310
Descripción
Summary:Title screen
A combination of two methods (nondestructive proton beam radioactivation analysis and optical microinterferometry) has been used for measuring the mass and linear thicknesses of AlN and CrN coatings deposited onto silicon substrates by means of magnetron sputtering. It is established that, at linear thickness from 2.2 to 5.7 μm, the density of deposits is close to that of bulk materials (3.26 g/cm3 for AlN and 5.9 g/cm3 for CrN), while the stoichiometry of nitrides can be controlled by varying the parameters of magnetron sputtering. The proposed method can also be used for determining the densities of metal carbide and oxide films used as wear-resistant coatings.
Режим доступа: по договору с организацией-держателем ресурса
DOI:10.1134/S106378502105028X

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