Atomic layer deposition-developed two-dimensional alpha-MoO3 windows excellent hydrogen peroxide electrochemical sensing capabilities
| Parent link: | Sensors and Actuators B: Chemical Vol. 262.— 2018.— [P. 334-344] |
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| Corporate Author: | |
| Other Authors: | , , , , , , , , , |
| Summary: | Title screen Two-dimensional (2D) alpha-MoO3 nano-films with thickness of 4.9 nm were fabricated via atomic layer deposition (ALD) technique for the first time on the wafer scale and were subsequently annealed at 200 °C. The developed MoO3 nano-films were composed of flat nanoparticles with the average size of about 35 nm and possessed layered orthorhombic phase (alpha-MoO3). The electrochemical sensor based on these 2D alpha-MoO3 nano-films exhibited great sensitivity of 168.72 muA mM-1 cm-2 to hydrogen peroxide (H2O2) and presented extremely wide linear detection range of 0.4 muM-57.6 mM with the lowest detection limit of 0.076 muM at the signal to noise ratio of 3. Furthermore, due to extremely thin nature of 2D alpha-MoO3 nano-films ultra-fast response/recovery time of 2.0 s was achieved under the wide linear H2O2 detection range. Additionally, the sensor based on 2D alpha-MoO3 nano-films was also demonstrated great long-term stability, excellent selectivity and high reproducibility. The 2D alpha-MoO3 nano-films fabricated via ALD technique in this work represent a great opportunity for development of high-performance electrochemical sensors based on 2D transition metal oxides. |
| Published: |
2018
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| Subjects: | |
| Online Access: | https://doi.org/10.1016/j.snb.2018.01.243 |
| Format: | Electronic Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=667274 |
MARC
| LEADER | 00000naa0a2200000 4500 | ||
|---|---|---|---|
| 001 | 667274 | ||
| 005 | 20250307145540.0 | ||
| 035 | |a (RuTPU)RU\TPU\network\38479 | ||
| 035 | |a RU\TPU\network\38148 | ||
| 090 | |a 667274 | ||
| 100 | |a 20220311d2018 k||y0rusy50 ba | ||
| 101 | 1 | |a eng | |
| 102 | |a NL | ||
| 135 | |a arcn ---uucaa | ||
| 181 | 0 | |a i | |
| 182 | 0 | |a b | |
| 200 | 1 | |a Atomic layer deposition-developed two-dimensional alpha-MoO3 windows excellent hydrogen peroxide electrochemical sensing capabilities |f Wei Zihan, Hai Zhenyin, M. K. Akbari [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 59 tit.] | ||
| 330 | |a Two-dimensional (2D) alpha-MoO3 nano-films with thickness of 4.9 nm were fabricated via atomic layer deposition (ALD) technique for the first time on the wafer scale and were subsequently annealed at 200 °C. The developed MoO3 nano-films were composed of flat nanoparticles with the average size of about 35 nm and possessed layered orthorhombic phase (alpha-MoO3). The electrochemical sensor based on these 2D alpha-MoO3 nano-films exhibited great sensitivity of 168.72 muA mM-1 cm-2 to hydrogen peroxide (H2O2) and presented extremely wide linear detection range of 0.4 muM-57.6 mM with the lowest detection limit of 0.076 muM at the signal to noise ratio of 3. Furthermore, due to extremely thin nature of 2D alpha-MoO3 nano-films ultra-fast response/recovery time of 2.0 s was achieved under the wide linear H2O2 detection range. Additionally, the sensor based on 2D alpha-MoO3 nano-films was also demonstrated great long-term stability, excellent selectivity and high reproducibility. The 2D alpha-MoO3 nano-films fabricated via ALD technique in this work represent a great opportunity for development of high-performance electrochemical sensors based on 2D transition metal oxides. | ||
| 461 | |t Sensors and Actuators B: Chemical | ||
| 463 | |t Vol. 262 |v [P. 334-344] |d 2018 | ||
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a alpha-MoO3 | |
| 610 | 1 | |a atomic layer deposition | |
| 610 | 1 | |a electrochemical sensing | |
| 610 | 1 | |a hydrogen peroxide | |
| 610 | 1 | |a осаждение | |
| 610 | 1 | |a атомные слои | |
| 610 | 1 | |a зондирование | |
| 610 | 1 | |a пероксид водорода | |
| 701 | 0 | |a Wei Zihan | |
| 701 | 0 | |a Hai Zhenyin | |
| 701 | 1 | |a Akbari |b M. K. |g Mohammad Karbalaei | |
| 701 | 1 | |a Qi |b D. |g Dongchen | |
| 701 | 0 | |a Xing Kaijian | |
| 701 | 0 | |a Zhao Qing | |
| 701 | 1 | |a Verpoort |b F. V. K. |c Chemical Engineer |c Professor of Tomsk Polytechnic University, doctor of chemical Sciences |f 1963- |g Frensis Valter Kornelius |3 (RuTPU)RU\TPU\pers\35059 |9 18334 | |
| 701 | 0 | |a Hu Jie | |
| 701 | 0 | |a Hyde Lachlan | |
| 701 | 1 | |a Zhuiykov |b S. |g Sergey | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Исследовательская школа химических и биомедицинских технологий |c (2017- ) |3 (RuTPU)RU\TPU\col\23537 |
| 801 | 2 | |a RU |b 63413507 |c 20220311 |g RCR | |
| 856 | 4 | |u https://doi.org/10.1016/j.snb.2018.01.243 | |
| 942 | |c CF | ||