Atomic layer deposition-developed two-dimensional alpha-MoO3 windows excellent hydrogen peroxide electrochemical sensing capabilities
| Parent link: | Sensors and Actuators B: Chemical Vol. 262.— 2018.— [P. 334-344] |
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| Other Authors: | , , , , , , , , , |
| Summary: | Title screen Two-dimensional (2D) alpha-MoO3 nano-films with thickness of 4.9 nm were fabricated via atomic layer deposition (ALD) technique for the first time on the wafer scale and were subsequently annealed at 200 °C. The developed MoO3 nano-films were composed of flat nanoparticles with the average size of about 35 nm and possessed layered orthorhombic phase (alpha-MoO3). The electrochemical sensor based on these 2D alpha-MoO3 nano-films exhibited great sensitivity of 168.72 muA mM-1 cm-2 to hydrogen peroxide (H2O2) and presented extremely wide linear detection range of 0.4 muM-57.6 mM with the lowest detection limit of 0.076 muM at the signal to noise ratio of 3. Furthermore, due to extremely thin nature of 2D alpha-MoO3 nano-films ultra-fast response/recovery time of 2.0 s was achieved under the wide linear H2O2 detection range. Additionally, the sensor based on 2D alpha-MoO3 nano-films was also demonstrated great long-term stability, excellent selectivity and high reproducibility. The 2D alpha-MoO3 nano-films fabricated via ALD technique in this work represent a great opportunity for development of high-performance electrochemical sensors based on 2D transition metal oxides. |
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2018
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| Online Access: | https://doi.org/10.1016/j.snb.2018.01.243 |
| Format: | Electronic Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=667274 |