Effect of Al Addition on the Oxidation Resistance of HfC Thin Films; Coatings; Vol. 12, iss. 1
| Parent link: | Coatings Vol. 12, iss. 1.— 2022.— [27, 7 p.] |
|---|---|
| Autor corporatiu: | , |
| Altres autors: | , , , |
| Sumari: | Title screen In this paper, we focus on the research of Al addition on Hf–Al–C film structure and oxidation resistance. It was found that obtained Hf–A–C films consist of a solid solution of Al in non-stoichiometric cubic HfC and have identical XRD patterns to bcc–HfC. Besides, the Al addition decreases the sample mass gain during oxidation in air at temperatures up to 800 °C. Mass gain for Hf–Al–C was 44.3 and 22.5% less, compared to pristine HfC, at 600 and 800 °C, respectively. |
| Idioma: | anglès |
| Publicat: |
2022
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| Matèries: | |
| Accés en línia: | http://earchive.tpu.ru/handle/11683/70753 https://doi.org/10.3390/coatings12010027 |
| Format: | MixedMaterials Electrònic Capítol de llibre |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=667194 |
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| 200 | 1 | |a Effect of Al Addition on the Oxidation Resistance of HfC Thin Films |f A. V. Gaydaychuk, S. A. Linnik, A. S. Mitulinsky, S. P. Zenkin | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 16 tit.] | ||
| 330 | |a In this paper, we focus on the research of Al addition on Hf–Al–C film structure and oxidation resistance. It was found that obtained Hf–A–C films consist of a solid solution of Al in non-stoichiometric cubic HfC and have identical XRD patterns to bcc–HfC. Besides, the Al addition decreases the sample mass gain during oxidation in air at temperatures up to 800 °C. Mass gain for Hf–Al–C was 44.3 and 22.5% less, compared to pristine HfC, at 600 and 800 °C, respectively. | ||
| 461 | |t Coatings | ||
| 463 | |t Vol. 12, iss. 1 |v [27, 7 p.] |d 2022 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a Hf–Al–C | |
| 610 | 1 | |a oxidation resistanc | |
| 610 | 1 | |a magnetron sputtering | |
| 610 | 1 | |a окисление | |
| 610 | 1 | |a магнетронное распыление | |
| 701 | 1 | |a Gaydaychuk |b A. V. |c physicist |c Postgraduate, Engineer - Researcher of Tomsk Polytechnic University |f 1984- |g Alexander Valerievich |3 (RuTPU)RU\TPU\pers\32876 |9 16724 | |
| 701 | 1 | |a Linnik |b S. A. |c physicist |c Engineer-Researcher of Tomsk Polytechnic University |f 1985- |g Stepan Andreevich |3 (RuTPU)RU\TPU\pers\32877 |9 16725 | |
| 701 | 1 | |a Mitulinsky |b A. S. |c electric power specialist |c technician of Tomsk Polytechnic University |f 1998- |g Aleksandr Sergeevich |3 (RuTPU)RU\TPU\pers\47113 | |
| 701 | 1 | |a Zenkin |b S. P. |c physicist |c Researcher of Tomsk Polytechnic University |f 1988- |g Sergey Petrovich |3 (RuTPU)RU\TPU\pers\41880 | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Исследовательская школа физики высокоэнергетических процессов |c (2017- ) |3 (RuTPU)RU\TPU\col\23551 |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Инженерная школа новых производственных технологий |b Отделение материаловедения |3 (RuTPU)RU\TPU\col\23508 |
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| 856 | 4 | |u http://earchive.tpu.ru/handle/11683/70753 | |
| 856 | 4 | |u https://doi.org/10.3390/coatings12010027 | |
| 942 | |c CF | ||