Radio frequency magnetron sputtering of Sr- and Mg-substituted ?-tricalcium phosphate: Analysis of the physicochemical properties and deposition rate of coatings

Radio frequency magnetron sputtering of Sr- and Mg-substituted ?-tricalcium phosphate: Analysis of the physicochemical properties and deposition rate of coatings

Bibliographic Details
Parent link:Applied Surface Science
Vol. 509.— 2020.— [144763, 10 p.]
Corporate Authors: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научно-образовательный центр Б. П. Вейнберга, Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Лаборатория плазменных гибридных систем
Other Authors: Kozelskaya A. I. Anna Ivanovna, Kulkova S. E. Svetlana Evgenjevna, Fedotkin A. Yu. Aleksandr Yurjevich, Bolbasov E. N. Evgeny Nikolaevich, Zhukov Yu. M. Yuriy Mikhaylovich, Stipniece L. Liga, Bakulin A. V. Aleksandr Viktorovich, Useinov A. S. Aleksey Serverovich, Shesterikov E. V. Evgeny Viktorovich, Locs J. Janis, Tverdokhlebov S. I. Sergei Ivanovich
Summary:Title screen
The effect of the sputtered target composition on the deposition rate of coatings formed by radio frequency magnetron sputtering (RFMS) is investigated. Strontium substitution in the sputtered ?-tricalcium phosphate (?-TCP) target composition increases the coating deposition rate, whereas magnesium substitution decreases the coating deposition rate. Computer modelling shows that both the unit cell volume and bond lengths increase when strontium is introduced into the crystal lattice, whereas the incorporation of magnesium leads to a decrease in these parameters. A correlation between the change in unit cell volume due to magnesium and strontium substitutions, and the coating deposition rate is also determined.
Режим доступа: по договору с организацией-держателем ресурса
Published: 2020
Subjects:
электронный ресурс
труды учёных ТПУ
β-tricalcium phosphate
magnesium substitutions
strontium substitutions
radio frequency magnetron sputtering
computer simulation
трикальций фосфат
замещения
магнетронное распыление
Online Access:https://doi.org/10.1016/j.apsusc.2019.144763
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=663760

Internet

https://doi.org/10.1016/j.apsusc.2019.144763

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