Formation and structural features of nitrogen-doped titanium dioxide thin films grown by reactive magnetron sputtering; Applied Surface Science; Vol. 534

Formation and structural features of nitrogen-doped titanium dioxide thin films grown by reactive magnetron sputtering

Bibliografiset tiedot
Parent link:	Applied Surface Science Vol. 534.— 2020.— Article number 147572, 10 p.
Muut tekijät:	Pustovalova A. A. Alla Aleksandrovna, Boytsova E. L. Elena Lvovna, Aubakirova D. Danagul, Bruns M. P. Michael, Tverdokhlebov S. I. Sergei Ivanovich, Pichugin V. F. Vladimir Fyodorovich
Yhteenveto:	Title screen The structural features of N-doped titanium dioxide (N-TiO2) thin films deposited via reactive magnetron sputtering system with different nitrogen to oxygen ratio are analyzed. Bias voltage was used as a significant parameter involved in the deposition process. Grown films have two-phase structure consisting of anatase and rutile mixture. The analysis of structure and morphology of the films by SEM, TEM, XRD, FTIR and XPS techniques showed the changing of anatase to rutile ratio and grain size reduction in N-TiO2 thin films with increase of nitrogen content in the working gas at simultaneous bias applying. Nitrogen atoms in oxide form are located at the crystallites boundaries and this 2D quasi-layer of NOx species limits the epitaxial growth of TiO2 crystallites during film formation Текстовый файл AM_Agreement
Kieli:	englanti
Julkaistu:	2020
Aiheet:	электронный ресурс труды учёных ТПУ titanium dioxide N-doped TiO2 nitrogen oxides bias voltage magnetron sputtering оксид титана оксид азота магнетронное распыление
Linkit:	https://doi.org/10.1016/j.apsusc.2020.147572
Aineistotyyppi:	Elektroninen Kirjan osa
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=663060

Internet

https://doi.org/10.1016/j.apsusc.2020.147572