Plasma-Chemical Deposition of Anti-Reflection and Protective Coating for Infrared Optics
| Parent link: | Russian Physics Journal Vol. 62, iss. 11.— 2020.— [P. 2112-2120] |
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| Corporate Authors: | , |
| Other Authors: | , , , , |
| Summary: | Title screen The films of amorphous hydrogenated carbon doped with Si and O were deposited onto the sample of crystalline silicon by method of plasma-chemical deposition in the mix of polyphenyl methylsiloxane vapors and argon. Physico-mechanical and optical properties of films were examined for their use as anti-reflection and protective coatings in infrared optics devices. Film transparency in the wavelength range of 2.5-8 μm was measured by method of infrared spectroscopy with a Fourier transform. The structure and composition of films were studied by methods of Raman and X-ray photoelectron spectroscopy. Hardness and other mechanical properties of films were determined by nanoindentation. It was shown that the double-sided deposition of a-C:H:SiOx films onto Si plates allows increasing their integrated transmission in the wavelength region of 3- 5 μm from 50 to 87%. The films possess excellent mechanical characteristics, thermal stability in the temperature range from room temperature to 500°С, and resistance to aqueous solutions of salt. Режим доступа: по договору с организацией-держателем ресурса |
| Published: |
2020
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| Subjects: | |
| Online Access: | https://doi.org/10.1007/s11182-019-01835-4 |
| Format: | Electronic Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=661650 |