Defect and ion distribution studies in ion-implanted silicon; Slow Positron Beam Techniques and Applications (SLOPOS-15)

Defect and ion distribution studies in ion-implanted silicon; Slow Positron Beam Techniques and Applications (SLOPOS-15)

Dades bibliogràfiques
Parent link:	Slow Positron Beam Techniques and Applications (SLOPOS-15).— 2019.— [P. 89]
Autor corporatiu:	Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Отделение экспериментальной физики
Altres autors:	Siemek K., Dryzek J., Mitura-Nowak M., Lomygin A. Anton
Sumari:	Title screen
Idioma:	anglès
Publicat:	2019
Matèries:	электронный ресурс труды учёных ТПУ
Accés en línia:	https://physics.mff.cuni.cz/kfnt/slopos/files/SLOPOS-15-book-of-abstracts.pdf#page=92
Format:	Electrònic Capítol de llibre
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=661412

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