Influence of a Hydrogen Atmosphere on the Properties of an Aluminum Oxide Film on VT1-0 Titanium

Influence of a Hydrogen Atmosphere on the Properties of an Aluminum Oxide Film on VT1-0 Titanium

Bibliographic Details
Parent link:	Technical Physics Vol. 64, iss. 4.— 2019.— [P. 518-522]
Corporate Authors:	Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Отделение экспериментальной физики, Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Отделение ядерно-топливного цикла, Национальный исследовательский Томский политехнический университет Школа базовой инженерной подготовки Отделение естественных наук
Other Authors:	Sypchenko V. S. Vladimir Sergeevich, Wang Cailun, Nikitenkov N. N. Nikolai Nikolaevich, Sigfusson T. I. Torsteinn Ingi, Kiseleva E. S. Evgeniya Sergeevna
Summary:	Title screen In this study, we have considered interaction between an aluminum oxide film magnetron-sputtered on commercially pure VT1-0 titanium and a hydrogen atmosphere. The time the system was exposed to hydrogen varied from 1 to 4 h with all other parameters remaining the same. Data for the distribution of hydrogen over the depth (film thickness) and its content in the thin-film system have been obtained, and the influence of the hold time in hydrogen on the adhesion and friction coefficient of the film has been revealed. In addition, the surface conductivity and hydrogen distribution in the aluminum oxide film have been determined. Режим доступа: по договору с организацией-держателем ресурса
Published:	2019
Subjects:	электронный ресурс труды учёных ТПУ водород пленки оксид алюминия
Online Access:	https://doi.org/10.1134/S1063784219040236
Format:	Electronic Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=661001

Internet

https://doi.org/10.1134/S1063784219040236