Effect of working gas on the deposition rate of CaP coatings formed by radio frequency magnetron sputtering of a hydroxyapatite target

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Parent link:	Journal of Physics: Conference Series Vol. 1313 : 26th International Conference on Vacuum Technique and Technology.— 2019.— [012018, 4 р.]
Tác giả chính:	Fedotkin A. Yu. Aleksandr Yurjevich
Tác giả của công ty:	Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научно-образовательный центр Б. П. Вейнберга
Tác giả khác:	Kozelskaya A. I. Anna Ivanovna, Tverdokhlebov S. I. Sergei Ivanovich
Tóm tắt:	Title screen This study is dedicated to the influence of the inert working gas on the deposition rate of CaP coatings formed by radio frequency magnetron sputtering of a hydroxyapatite target in Ar, Kr and Xe. The optical emission spectra of plasma, the elemental and phase composition of the formed coatings are investigated. The deposition rates of the CaP coatings formed in Ar and Kr are approximately comparable and higher than ones formed in Xe.
Ngôn ngữ:	Tiếng Anh
Được phát hành:	2019
Những chủ đề:	электронный ресурс труды учёных ТПУ скорости осаждение рабочий газ
Truy cập trực tuyến:	https://doi.org/10.1088/1742-6596/1313/1/012018
Định dạng:	Điện tử Chương của sách
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=660990

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