Controlling the Properties of Metal Films Deposited Using Magnetron Sputtering Systems with Evaporative Targets; Surface Modification of Materials by Ion Beams (SMMIB-2019)

Controlling the Properties of Metal Films Deposited Using Magnetron Sputtering Systems with Evaporative Targets; Surface Modification of Materials by Ion Beams (SMMIB-2019)

Podrobná bibliografie
Parent link:	Surface Modification of Materials by Ion Beams (SMMIB-2019).— 2019.— [P. 106]
Korporativní autor:	Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научно-образовательный центр Б. П. Вейнберга
Další autoři:	Bleykher (Bleicher) G. A. Galina Alekseevna, Yuryeva A. V. Alena Victorovna, Sidelev D. V. Dmitry Vladimirovich, Shabunin A. S. Artem Sergeevich, Yuriev Yu. N. Yuri Nikolaevich
Shrnutí:	Заглавие с экрана
Jazyk:	angličtina
Vydáno:	2019
Edice:	Ion-Assisted Coating Deposition. Poster Session
Témata:	электронный ресурс труды учёных ТПУ металлические пленки осаждение магнетронные системы распылительные системы мишени magnetron sputtering systems metal films and coatings sputtering evaporation film growth
On-line přístup:	https://smmib.ru/assets/files/SMMIB2019_TOMSK_full.pdf#page=107
Médium:	Elektronický zdroj Kapitola
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=660888

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