Controlling the Properties of Metal Films Deposited Using Magnetron Sputtering Systems with Evaporative Targets

Controlling the Properties of Metal Films Deposited Using Magnetron Sputtering Systems with Evaporative Targets

Bibliographic Details
Parent link:	Surface Modification of Materials by Ion Beams (SMMIB-2019): 21st International Conference, 25-30 August 2019, Tomsk, Russia/ National Research Tomsk Polytechnic University (TPU). [P. 106].— , 2019
Corporate Author:	Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научно-образовательный центр Б. П. Вейнберга
Other Authors:	Bleykher (Bleicher) G. A. Galina Alekseevna, Yuryeva A. V. Alena Victorovna, Sidelev D. V. Dmitry Vladimirovich, Shabunin A. S. Artem Sergeevich, Yuriev Yu. N. Yuri Nikolaevich
Summary:	Заглавие с экрана
Published:	2019
Series:	Ion-Assisted Coating Deposition. Poster Session
Subjects:	электронный ресурс труды учёных ТПУ металлические пленки осаждение магнетронные системы распылительные системы мишени magnetron sputtering systems metal films and coatings sputtering evaporation film growth
Online Access:	https://smmib.ru/assets/files/SMMIB2019_TOMSK_full.pdf#page=107
Format:	Electronic Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=660888

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