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Controlling the Properties of Metal Films Deposited Using Magnetron Sputtering Systems with Evaporative Targets; Surface Modification of Materials by Ion Beams (SMMIB-2019)

Controlling the Properties of Metal Films Deposited Using Magnetron Sputtering Systems with Evaporative Targets; Surface Modification of Materials by Ion Beams (SMMIB-2019)

Bibliographic Details
Parent link:Surface Modification of Materials by Ion Beams (SMMIB-2019).— 2019.— [P. 106]
Corporate Author: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научно-образовательный центр Б. П. Вейнберга
Other Authors: Bleykher (Bleicher) G. A. Galina Alekseevna, Yuryeva A. V. Alena Victorovna, Sidelev D. V. Dmitry Vladimirovich, Shabunin A. S. Artem Sergeevich, Yuriev Yu. N. Yuri Nikolaevich
Summary:Заглавие с экрана
Language:English
Published: 2019
Series:Ion-Assisted Coating Deposition. Poster Session
Subjects:
электронный ресурс
труды учёных ТПУ
металлические пленки
осаждение
магнетронные системы
распылительные системы
мишени
magnetron sputtering systems
metal films and coatings
sputtering
evaporation
film growth
Online Access:https://smmib.ru/assets/files/SMMIB2019_TOMSK_full.pdf#page=107
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=660888
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https://smmib.ru/assets/files/SMMIB2019_TOMSK_full.pdf#page=107

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