High-Intensity Implantation of Metal Ions in Conditions of Minimizing Ion Sputtering of the Material Surface

High-Intensity Implantation of Metal Ions in Conditions of Minimizing Ion Sputtering of the Material Surface

Detalhes bibliográficos
Parent link:	Surface Modification of Materials by Ion Beams (SMMIB-2019): 21st International Conference, 25-30 August 2019, Tomsk, Russia/ National Research Tomsk Polytechnic University (TPU). [P. 74].— , 2019
Corporate Authors:	Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научная лаборатория высокоинтенсивной имплантации ионов, Национальный исследовательский Томский политехнический университет Инженерная школа информационных технологий и робототехники Отделение информационных технологий
Outros Autores:	Sivin D. O. Denis Olegovich, Ryabchikov A. I. Aleksandr Ilyich, Ananin P. S. Petr Semenovich, Stepanov I. B. Igor Borisovich, Modebadze G. S. Georgy Slavovich, Koval T. V. Tamara Vasilievna
Resumo:	Заглавие с экрана
Idioma:	inglês
Publicado em:	2019
Colecção:	Ion Beam Processing of Materials. Poster Session
Assuntos:	электронный ресурс труды учёных ТПУ имплантация ионы металлов минимизация ионное распыление поверхности материалы
Acesso em linha:	https://smmib.ru/assets/files/SMMIB2019_TOMSK_full.pdf#page=75
Formato:	Recurso Electrónico Capítulo de Livro
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=660878

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