Mechanical and tribological characteristics of a-C:H:SiOx films formed by PACVD on titanium alloy VT1-0
| Parent link: | IOP Conference Series: Materials Science and Engineering Vol. 511 : Perspective Materials of Constructional and Medical Purpose.— 2019.— [012019, 7 p.] |
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| Zusammenfassung: | Title screen This paper is devoted to the study of the mechanical and tribological properties of aC:H:SiOx films deposited on a titanium alloy VT1-0 by a plasma chemical deposition method using pulsed bipolar bias voltage. It was shown that after deposition of 2 [mu]m-thick a-C:H:SiOx film on a titanium alloy VT1-0 sample, the root-mean-square surface roughness Rq measured using atomic force microscopy decreased from 74 to 50 nm compared to the original substrate. The surface hardness H measured using nanoindentation increased from 3.3 to 12.4 GPa with an almost unchanged elasticity modulus E. As a result, the plasticity index (H/E) of titanium samples increased from 0.03 to 0.11, and the plastic deformation resistance (H3/E2 ) increased from 3 to 156 MPa. Deposition of a-C:H:SiOx film on the titanium alloy VT1-0 surface makes possible to reduce the friction coefficient from 0.3-0.6 to 0.1 and the wear rate from 6·10-4 to 7•10{-6} mm{3} /Nm. |
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2019
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| Online-Zugang: | http://dx.doi.org/10.1088/1757-899X/511/1/012019 http://earchive.tpu.ru/handle/11683/55432 |
| Format: | Elektronisch Buchkapitel |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=660538 |