Operation parameters of magnetron diode for high-rate deposition of aluminum films; Journal of Physics: Conference Series; Vol. 1115 : 6th International Congress "Energy Fluxes and Radiation Effects". 14th International Conference on Modification of Materials with Particle Beams and Plasma Flows (14th CMM)

Operation parameters of magnetron diode for high-rate deposition of aluminum films; Journal of Physics: Conference Series; Vol. 1115 : 6th International Congress "Energy Fluxes and Radiation Effects". 14th International Conference on Modification of Materials with Particle Beams and Plasma Flows (14th CMM)

Detaylı Bibliyografya
Parent link:Journal of Physics: Conference Series
Vol. 1115 : 6th International Congress "Energy Fluxes and Radiation Effects". 14th International Conference on Modification of Materials with Particle Beams and Plasma Flows (14th CMM).— 2018.— [032020, 5 p.]
Yazar: Sidelev D. V. Dmitry Vladimirovich
Müşterek Yazar: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научно-образовательный центр Б. П. Вейнберга
Diğer Yazarlar: Grudinin V. A. Vladislav Alekseevich
Özet:Title screen
This article reports on the results of the detailed study of erosion of Al target in magnetron discharge plasma. It was demonstrated that the combination of middle-frequency (MF) and high impulse power (HiPIMS) power supply results in the significant increase of deposition rates of Al films by changing of sputtering yield. The MF pulse assists HiPIMS discharge to transit in a high power mode.
Dil:İngilizce
Baskı/Yayın Bilgisi: 2018
Konular:
электронный ресурс
труды учёных ТПУ
магнетронный разряд
плазма
осаждение
алюминиевые пленки
Online Erişim:http://earchive.tpu.ru/handle/11683/57378
https://doi.org/10.1088/1742-6596/1115/3/032020
Materyal Türü: Elektronik Kitap Bölümü
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=660038

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