Operation parameters of magnetron diode for high-rate deposition of aluminum films; Journal of Physics: Conference Series; Vol. 1115 : 6th International Congress "Energy Fluxes and Radiation Effects". 14th International Conference on Modification of Materials with Particle Beams and Plasma Flows (14th CMM)

Bibliografiset tiedot
Parent link:	Journal of Physics: Conference Series Vol. 1115 : 6th International Congress "Energy Fluxes and Radiation Effects". 14th International Conference on Modification of Materials with Particle Beams and Plasma Flows (14th CMM).— 2018.— [032020, 5 p.]
Päätekijä:	Sidelev D. V. Dmitry Vladimirovich
Yhteisötekijä:	Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научно-образовательный центр Б. П. Вейнберга
Muut tekijät:	Grudinin V. A. Vladislav Alekseevich
Yhteenveto:	Title screen This article reports on the results of the detailed study of erosion of Al target in magnetron discharge plasma. It was demonstrated that the combination of middle-frequency (MF) and high impulse power (HiPIMS) power supply results in the significant increase of deposition rates of Al films by changing of sputtering yield. The MF pulse assists HiPIMS discharge to transit in a high power mode.
Kieli:	englanti
Julkaistu:	2018
Aiheet:	электронный ресурс труды учёных ТПУ магнетронный разряд плазма осаждение алюминиевые пленки
Linkit:	http://earchive.tpu.ru/handle/11683/57378 https://doi.org/10.1088/1742-6596/1115/3/032020
Aineistotyyppi:	Elektroninen Kirjan osa
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=660038

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