Operation parameters of magnetron diode for high-rate deposition of aluminum films
| Parent link: | Journal of Physics: Conference Series Vol. 1115 : 6th International Congress "Energy Fluxes and Radiation Effects". 14th International Conference on Modification of Materials with Particle Beams and Plasma Flows (14th CMM).— 2018.— [032020, 5 p.] |
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| Zusammenfassung: | Title screen This article reports on the results of the detailed study of erosion of Al target in magnetron discharge plasma. It was demonstrated that the combination of middle-frequency (MF) and high impulse power (HiPIMS) power supply results in the significant increase of deposition rates of Al films by changing of sputtering yield. The MF pulse assists HiPIMS discharge to transit in a high power mode. |
| Sprache: | Englisch |
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2018
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| Online-Zugang: | http://earchive.tpu.ru/handle/11683/57378 https://doi.org/10.1088/1742-6596/1115/3/032020 |
| Format: | Elektronisch Buchkapitel |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=660038 |