Operation parameters of magnetron diode for high-rate deposition of aluminum films
| Parent link: | Journal of Physics: Conference Series Vol. 1115 : 6th International Congress "Energy Fluxes and Radiation Effects". 14th International Conference on Modification of Materials with Particle Beams and Plasma Flows (14th CMM).— 2018.— [032020, 5 p.] |
|---|---|
| 第一著者: | |
| その他の著者: | |
| 要約: | Title screen This article reports on the results of the detailed study of erosion of Al target in magnetron discharge plasma. It was demonstrated that the combination of middle-frequency (MF) and high impulse power (HiPIMS) power supply results in the significant increase of deposition rates of Al films by changing of sputtering yield. The MF pulse assists HiPIMS discharge to transit in a high power mode. |
| 言語: | 英語 |
| 出版事項: |
2018
|
| 主題: | |
| オンライン･アクセス: | http://earchive.tpu.ru/handle/11683/57378 https://doi.org/10.1088/1742-6596/1115/3/032020 |
| フォーマット: | 電子媒体 図書の章 |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=660038 |