Operation parameters of magnetron diode for high-rate deposition of aluminum films; Journal of Physics: Conference Series; Vol. 1115 : 6th International Congress "Energy Fluxes and Radiation Effects". 14th International Conference on Modification of Materials with Particle Beams and Plasma Flows (14th CMM)

Xehetasun bibliografikoak
Parent link:Journal of Physics: Conference Series
Vol. 1115 : 6th International Congress "Energy Fluxes and Radiation Effects". 14th International Conference on Modification of Materials with Particle Beams and Plasma Flows (14th CMM).— 2018.— [032020, 5 p.]
Egile nagusia: Sidelev D. V. Dmitry Vladimirovich
Erakunde egilea: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научно-образовательный центр Б. П. Вейнберга
Beste egile batzuk: Grudinin V. A. Vladislav Alekseevich
Gaia:Title screen
This article reports on the results of the detailed study of erosion of Al target in magnetron discharge plasma. It was demonstrated that the combination of middle-frequency (MF) and high impulse power (HiPIMS) power supply results in the significant increase of deposition rates of Al films by changing of sputtering yield. The MF pulse assists HiPIMS discharge to transit in a high power mode.
Hizkuntza:ingelesa
Argitaratua: 2018
Gaiak:
Sarrera elektronikoa:http://earchive.tpu.ru/handle/11683/57378
https://doi.org/10.1088/1742-6596/1115/3/032020
Formatua: Baliabide elektronikoa Liburu kapitulua
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=660038

MARC

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330 |a This article reports on the results of the detailed study of erosion of Al target in magnetron discharge plasma. It was demonstrated that the combination of middle-frequency (MF) and high impulse power (HiPIMS) power supply results in the significant increase of deposition rates of Al films by changing of sputtering yield. The MF pulse assists HiPIMS discharge to transit in a high power mode. 
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