Peculiarities of metal coatings deposition using magnetron sputtering systems with hot and evaporative targets; Journal of Physics: Conference Series; Vol. 1115 : 6th International Congress "Energy Fluxes and Radiation Effects". 14th International Conference on Modification of Materials with Particle Beams and Plasma Flows (14th CMM)

Dades bibliogràfiques
Parent link:Journal of Physics: Conference Series
Vol. 1115 : 6th International Congress "Energy Fluxes and Radiation Effects". 14th International Conference on Modification of Materials with Particle Beams and Plasma Flows (14th CMM).— 2018.— [032065, 6 p.]
Autor corporatiu: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научно-образовательный центр Б. П. Вейнберга
Altres autors: Bleykher (Bleicher) G. A. Galina Alekseevna, Sidelev D. V. Dmitry Vladimirovich, Grudinin V. A. Vladislav Alekseevich, Krivobokov V. P. Valery Pavlovich, Yuryeva A. V. Alena Victorovna
Sumari:Title screen
This article reports on the pecularities of Cr and Cu coatings deposited by magnetron sputtering with hot and evaporative targets. There is shown the role of heat radiation from hot (evaporative) target and sublimated particle flux in energy flux density on the substrate and deposition rates. The Cr and Cu films were investigated by X-ray diffraction, scanning electron microscopy, nanoindentation, electrical conductivity and corrosion tests.
Idioma:anglès
Publicat: 2018
Matèries:
Accés en línia:https://doi.org/10.1088/1742-6596/1115/3/032065
Format: MixedMaterials Electrònic Capítol de llibre
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=660019

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