Peculiarities of metal coatings deposition using magnetron sputtering systems with hot and evaporative targets

Peculiarities of metal coatings deposition using magnetron sputtering systems with hot and evaporative targets

Bibliografiset tiedot
Parent link:	Journal of Physics: Conference Series Vol. 1115 : 6th International Congress "Energy Fluxes and Radiation Effects". 14th International Conference on Modification of Materials with Particle Beams and Plasma Flows (14th CMM).— 2018.— [032065, 6 p.]
Yhteisötekijä:	Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научно-образовательный центр Б. П. Вейнберга
Muut tekijät:	Bleykher (Bleicher) G. A. Galina Alekseevna, Sidelev D. V. Dmitry Vladimirovich, Grudinin V. A. Vladislav Alekseevich, Krivobokov V. P. Valery Pavlovich, Yuryeva A. V. Alena Victorovna
Yhteenveto:	Title screen This article reports on the pecularities of Cr and Cu coatings deposited by magnetron sputtering with hot and evaporative targets. There is shown the role of heat radiation from hot (evaporative) target and sublimated particle flux in energy flux density on the substrate and deposition rates. The Cr and Cu films were investigated by X-ray diffraction, scanning electron microscopy, nanoindentation, electrical conductivity and corrosion tests.
Kieli:	englanti
Julkaistu:	2018
Aiheet:	электронный ресурс труды учёных ТПУ магнетронное распыление тепловое излучение рентгеновская дифракция
Linkit:	https://doi.org/10.1088/1742-6596/1115/3/032065
Aineistotyyppi:	Elektroninen Kirjan osa
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=660019

Internet

https://doi.org/10.1088/1742-6596/1115/3/032065