Peculiarities of metal coatings deposition using magnetron sputtering systems with hot and evaporative targets

Podrobná bibliografie
Parent link:Journal of Physics: Conference Series
Vol. 1115 : 6th International Congress "Energy Fluxes and Radiation Effects". 14th International Conference on Modification of Materials with Particle Beams and Plasma Flows (14th CMM).— 2018.— [032065, 6 p.]
Korporativní autor: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научно-образовательный центр Б. П. Вейнберга
Další autoři: Bleykher (Bleicher) G. A. Galina Alekseevna, Sidelev D. V. Dmitry Vladimirovich, Grudinin V. A. Vladislav Alekseevich, Krivobokov V. P. Valery Pavlovich, Yuryeva A. V. Alena Victorovna
Shrnutí:Title screen
This article reports on the pecularities of Cr and Cu coatings deposited by magnetron sputtering with hot and evaporative targets. There is shown the role of heat radiation from hot (evaporative) target and sublimated particle flux in energy flux density on the substrate and deposition rates. The Cr and Cu films were investigated by X-ray diffraction, scanning electron microscopy, nanoindentation, electrical conductivity and corrosion tests.
Vydáno: 2018
Témata:
On-line přístup:https://doi.org/10.1088/1742-6596/1115/3/032065
Médium: Elektronický zdroj Kapitola
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=660019
Popis
Shrnutí:Title screen
This article reports on the pecularities of Cr and Cu coatings deposited by magnetron sputtering with hot and evaporative targets. There is shown the role of heat radiation from hot (evaporative) target and sublimated particle flux in energy flux density on the substrate and deposition rates. The Cr and Cu films were investigated by X-ray diffraction, scanning electron microscopy, nanoindentation, electrical conductivity and corrosion tests.
DOI:10.1088/1742-6596/1115/3/032065