Peculiarities of metal coatings deposition using magnetron sputtering systems with hot and evaporative targets
| Parent link: | Journal of Physics: Conference Series Vol. 1115 : 6th International Congress "Energy Fluxes and Radiation Effects". 14th International Conference on Modification of Materials with Particle Beams and Plasma Flows (14th CMM).— 2018.— [032065, 6 p.] |
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| Korporativní autor: | |
| Další autoři: | , , , , |
| Shrnutí: | Title screen This article reports on the pecularities of Cr and Cu coatings deposited by magnetron sputtering with hot and evaporative targets. There is shown the role of heat radiation from hot (evaporative) target and sublimated particle flux in energy flux density on the substrate and deposition rates. The Cr and Cu films were investigated by X-ray diffraction, scanning electron microscopy, nanoindentation, electrical conductivity and corrosion tests. |
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2018
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| On-line přístup: | https://doi.org/10.1088/1742-6596/1115/3/032065 |
| Médium: | Elektronický zdroj Kapitola |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=660019 |
| Shrnutí: | Title screen This article reports on the pecularities of Cr and Cu coatings deposited by magnetron sputtering with hot and evaporative targets. There is shown the role of heat radiation from hot (evaporative) target and sublimated particle flux in energy flux density on the substrate and deposition rates. The Cr and Cu films were investigated by X-ray diffraction, scanning electron microscopy, nanoindentation, electrical conductivity and corrosion tests. |
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| DOI: | 10.1088/1742-6596/1115/3/032065 |