Structure, Mechanical and Optical Properties of Silicon-Rich Al–Si–N Films Prepared by High Power Impulse Magnetron Sputtering

Structure, Mechanical and Optical Properties of Silicon-Rich Al–Si–N Films Prepared by High Power Impulse Magnetron Sputtering

Detalhes bibliográficos
Parent link:Coatings
Vol. 9, iss. 1.— 2019.— [53, 6 p.]
Autor Corporativo: Национальный исследовательский Томский политехнический университет Исследовательская школа физики высокоэнергетических процессов
Outros Autores: Zenkin S. P. Sergey Petrovich, Konusov F. V. Fedor Valerievich, Lauk A. L. Aleksandr Lukyanovich, Zelentsov D. Yu. Denis Yurjevich, Demchenko S. G. Stanislav Gennadjevich
Resumo:Title screen
This article reports on the influence of the sputtering parameters (discharge voltage, average target power density) of a high power impulse magnetron discharge (HiPIMS) on the structure, mechanical and optical properties of silicon-rich Al–Si–N films. We show that with the change of a discharge target power density in the range of 30–120 W/cm2, the hardness of the sputtered Al–Si–N films nonlinearly changes in the range of 22–29 GPa, while the concentration of the absorption centers changes in the range of 1018–1020/cm3. The optical spectra of the HiPIMS sputtered films are completely different from the Al–Si–N films prepared by a direct current magnetron sputtering, with an absence of “monoenergetic” optical absorption centers, which are attributed to point defects.
Publicado em: 2019
Assuntos:
электронный ресурс
труды учёных ТПУ
HiPIMS
Al–Si–N
silicon nitride
microstructure
нитрид кремния
микроструктура
Acesso em linha:http://dx.doi.org/10.3390/coatings9010053
Formato: Recurso Electrónico Capítulo de Livro
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=659302

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