Structure, Mechanical and Optical Properties of Silicon-Rich Al–Si–N Films Prepared by High Power Impulse Magnetron Sputtering
| Parent link: | Coatings Vol. 9, iss. 1.— 2019.— [53, 6 p.] |
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| Corporate Author: | |
| Other Authors: | , , , , |
| Summary: | Title screen This article reports on the influence of the sputtering parameters (discharge voltage, average target power density) of a high power impulse magnetron discharge (HiPIMS) on the structure, mechanical and optical properties of silicon-rich Al–Si–N films. We show that with the change of a discharge target power density in the range of 30–120 W/cm2, the hardness of the sputtered Al–Si–N films nonlinearly changes in the range of 22–29 GPa, while the concentration of the absorption centers changes in the range of 1018–1020/cm3. The optical spectra of the HiPIMS sputtered films are completely different from the Al–Si–N films prepared by a direct current magnetron sputtering, with an absence of “monoenergetic” optical absorption centers, which are attributed to point defects. |
| Published: |
2019
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| Online Access: | http://dx.doi.org/10.3390/coatings9010053 |
| Format: | Electronic Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=659302 |