Investigating Thin Ti–O–N Films Deposited via Reactive Magnetron Sputtering

Investigating Thin Ti–O–N Films Deposited via Reactive Magnetron Sputtering

Dades bibliogràfiques
Parent link:	Bulletin of the Russian Academy of Sciences: Physics: Scientific Journal.— , 2007- Vol. 82, iss. 9.— 2018.— [P. 1143-1147]
Autor principal:	Boytsova E. L. Elena Lvovna
Autor corporatiu:	Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Отделение ядерно-топливного цикла
Altres autors:	Leonova L. A. Liliya Aleksandrovna
Sumari:	Title screen Infrared spectroscopy and atomic emission analysis help establish the corrosion resistance of Ti‒O-N films deposited on steel substrates via reactive magnetron sputtering, along with potential biological activity by detecting nitric oxide in model solutions after contact with Ti-O-N coatings. Differential thermal analysis and scanning electron microscopy allow the thermal stability of the films to be judged at temperatures of up to 1300°C. Режим доступа: по договору с организацией-держателем ресурса
Publicat:	2018
Matèries:	электронный ресурс труды учёных ТПУ инфракрасная спектроскопия коррозионная стойкость магнетронное распыление
Accés en línia:	https://doi.org/10.3103/S1062873818090058
Format:	Electrònic Capítol de llibre
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=658737

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