Investigating Thin Ti–O–N Films Deposited via Reactive Magnetron Sputtering; Bulletin of the Russian Academy of Sciences: Physics; Vol. 82, iss. 9
| Parent link: | Bulletin of the Russian Academy of Sciences: Physics: Scientific Journal.— , 2007- Vol. 82, iss. 9.— 2018.— [P. 1143-1147] |
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| סיכום: | Title screen Infrared spectroscopy and atomic emission analysis help establish the corrosion resistance of Ti‒O-N films deposited on steel substrates via reactive magnetron sputtering, along with potential biological activity by detecting nitric oxide in model solutions after contact with Ti-O-N coatings. Differential thermal analysis and scanning electron microscopy allow the thermal stability of the films to be judged at temperatures of up to 1300°C. Режим доступа: по договору с организацией-держателем ресурса |
| שפה: | אנגלית |
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2018
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| גישה מקוונת: | https://doi.org/10.3103/S1062873818090058 |
| פורמט: | אלקטרוני Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=658737 |