Investigating Thin Ti–O–N Films Deposited via Reactive Magnetron Sputtering
| Parent link: | Bulletin of the Russian Academy of Sciences: Physics: Scientific Journal.— , 2007- Vol. 82, iss. 9.— 2018.— [P. 1143-1147] |
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| Main Author: | |
| Corporate Author: | |
| Other Authors: | |
| Summary: | Title screen Infrared spectroscopy and atomic emission analysis help establish the corrosion resistance of Ti‒O-N films deposited on steel substrates via reactive magnetron sputtering, along with potential biological activity by detecting nitric oxide in model solutions after contact with Ti-O-N coatings. Differential thermal analysis and scanning electron microscopy allow the thermal stability of the films to be judged at temperatures of up to 1300°C. Режим доступа: по договору с организацией-держателем ресурса |
| Language: | English |
| Published: |
2018
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| Subjects: | |
| Online Access: | https://doi.org/10.3103/S1062873818090058 |
| Format: | Electronic Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=658737 |
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| 200 | 1 | |a Investigating Thin Ti–O–N Films Deposited via Reactive Magnetron Sputtering |f E. L. Boytsova, L. A. Leonova | |
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| 300 | |a Title screen | ||
| 320 | |a [References: p. 1147 (14 tit.)] | ||
| 330 | |a Infrared spectroscopy and atomic emission analysis help establish the corrosion resistance of Ti‒O-N films deposited on steel substrates via reactive magnetron sputtering, along with potential biological activity by detecting nitric oxide in model solutions after contact with Ti-O-N coatings. Differential thermal analysis and scanning electron microscopy allow the thermal stability of the films to be judged at temperatures of up to 1300°C. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | 1 | |t Bulletin of the Russian Academy of Sciences: Physics |o Scientific Journal |d 2007- | |
| 463 | 1 | |t Vol. 82, iss. 9 |v [P. 1143-1147] |d 2018 | |
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