Investigating Thin Ti–O–N Films Deposited via Reactive Magnetron Sputtering; Bulletin of the Russian Academy of Sciences: Physics; Vol. 82, iss. 9

書目詳細資料
Parent link:Bulletin of the Russian Academy of Sciences: Physics: Scientific Journal.— , 2007-
Vol. 82, iss. 9.— 2018.— [P. 1143-1147]
主要作者: Boytsova E. L. Elena Lvovna
企業作者: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Отделение ядерно-топливного цикла
其他作者: Leonova L. A. Liliya Aleksandrovna
總結:Title screen
Infrared spectroscopy and atomic emission analysis help establish the corrosion resistance of Ti‒O-N films deposited on steel substrates via reactive magnetron sputtering, along with potential biological activity by detecting nitric oxide in model solutions after contact with Ti-O-N coatings. Differential thermal analysis and scanning electron microscopy allow the thermal stability of the films to be judged at temperatures of up to 1300°C.
Режим доступа: по договору с организацией-держателем ресурса
語言:英语
出版: 2018
主題:
在線閱讀:https://doi.org/10.3103/S1062873818090058
格式: 電子 Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=658737
實物特徵
總結:Title screen
Infrared spectroscopy and atomic emission analysis help establish the corrosion resistance of Ti‒O-N films deposited on steel substrates via reactive magnetron sputtering, along with potential biological activity by detecting nitric oxide in model solutions after contact with Ti-O-N coatings. Differential thermal analysis and scanning electron microscopy allow the thermal stability of the films to be judged at temperatures of up to 1300°C.
Режим доступа: по договору с организацией-держателем ресурса
DOI:10.3103/S1062873818090058