Effect of surface modification by silicon ion beam on microstructure and chemical composition of near-surface layers of titanium nickelide
| Parent link: | Inorganic Materials: Applied Research.— , 2010- Vol. 4, iss. 5.— 2013.— [P. 457-463] |
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| Tác giả của công ty: | |
| Tác giả khác: | , , , , , |
| Tóm tắt: | Title screen Regularities of changes in chemical composition and microstructure of titanium nickelide upon high-dose ion-beam implantation of silicon into its surface were studied. It was shown that irradiation of a TiNi alloy with silicon ion beams results in formation of a surface oxide layer about six times thicker than that at the surface of the unirradiated alloy. The surface oxide layer of the ion-beam-modified alloy has an oxygen concentration which is ~20% greater than that of the unmodified TiNi surface layer and lacks nickel, whose concentration is near zero to a sample depth of about 20 nm. Investigation of the near-surface region beneath the irradiated surface of TiNi samples by electron backscatter diffraction revealed that, under the action of a silicon ion beam, the near-surface region of individual B2-phase grains rising to the surface is fragmented with formation of a grain-subgrain structure with fragment (grain) sizes decreased down to 5 to 15 µm. It was suggested that grain orientation influences the observed effect. Режим доступа: по договору с организацией-держателем ресурса |
| Ngôn ngữ: | Tiếng Anh |
| Được phát hành: |
2013
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| Những chủ đề: | |
| Truy cập trực tuyến: | http://dx.doi.org/10.1134/S2075113313050134 |
| Định dạng: | Điện tử Chương của sách |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=654299 |
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| 200 | 1 | |a Effect of surface modification by silicon ion beam on microstructure and chemical composition of near-surface layers of titanium nickelide |f S. G. Psakhie [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: p. 462-463 (19 tit.)] | ||
| 330 | |a Regularities of changes in chemical composition and microstructure of titanium nickelide upon high-dose ion-beam implantation of silicon into its surface were studied. It was shown that irradiation of a TiNi alloy with silicon ion beams results in formation of a surface oxide layer about six times thicker than that at the surface of the unirradiated alloy. The surface oxide layer of the ion-beam-modified alloy has an oxygen concentration which is ~20% greater than that of the unmodified TiNi surface layer and lacks nickel, whose concentration is near zero to a sample depth of about 20 nm. Investigation of the near-surface region beneath the irradiated surface of TiNi samples by electron backscatter diffraction revealed that, under the action of a silicon ion beam, the near-surface region of individual B2-phase grains rising to the surface is fragmented with formation of a grain-subgrain structure with fragment (grain) sizes decreased down to 5 to 15 µm. It was suggested that grain orientation influences the observed effect. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Inorganic Materials: Applied Research |d 2010- | ||
| 463 | |t Vol. 4, iss. 5 |v [P. 457-463] |d 2013 | ||
| 610 | 1 | |a электронный ресурс | |
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| 701 | 1 | |a Psakhie |b S. G. |c physicist |c head of laboratory, Advisor to the rector, head of Department, Tomsk Polytechnic University, doctor of physico-mathematical Sciences |f 1952- |g Sergey Grigorievich |3 (RuTPU)RU\TPU\pers\33038 | |
| 701 | 1 | |a Lotkov |b A. I. | |
| 701 | 1 | |a Meisner |b S. N. | |
| 701 | 1 | |a Meisner |b L. L. | |
| 701 | 1 | |a Sergeev |b V. P. |c specialist in the field of materials science |c Professor of Tomsk Polytechnic University, doctor of technical Sciences |f 1949- |g Viktor Petrovich |3 (RuTPU)RU\TPU\pers\32730 |9 16615 | |
| 701 | 1 | |a Sungatulin |b A. R. | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет (ТПУ) |b Институт физики высоких технологий (ИФВТ) |b Кафедра физики высоких технологий в машиностроении (ФВТМ) |3 (RuTPU)RU\TPU\col\18687 |
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| 856 | 4 | |u http://dx.doi.org/10.1134/S2075113313050134 | |
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