Effect of surface modification by silicon ion beam on microstructure and chemical composition of near-surface layers of titanium nickelide
| Parent link: | Inorganic Materials: Applied Research.— , 2010- Vol. 4, iss. 5.— 2013.— [P. 457-463] |
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| Other Authors: | , , , , , |
| Summary: | Title screen Regularities of changes in chemical composition and microstructure of titanium nickelide upon high-dose ion-beam implantation of silicon into its surface were studied. It was shown that irradiation of a TiNi alloy with silicon ion beams results in formation of a surface oxide layer about six times thicker than that at the surface of the unirradiated alloy. The surface oxide layer of the ion-beam-modified alloy has an oxygen concentration which is ~20% greater than that of the unmodified TiNi surface layer and lacks nickel, whose concentration is near zero to a sample depth of about 20 nm. Investigation of the near-surface region beneath the irradiated surface of TiNi samples by electron backscatter diffraction revealed that, under the action of a silicon ion beam, the near-surface region of individual B2-phase grains rising to the surface is fragmented with formation of a grain-subgrain structure with fragment (grain) sizes decreased down to 5 to 15 µm. It was suggested that grain orientation influences the observed effect. Режим доступа: по договору с организацией-держателем ресурса |
| Language: | English |
| Published: |
2013
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| Subjects: | |
| Online Access: | http://dx.doi.org/10.1134/S2075113313050134 |
| Format: | Electronic Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=654299 |