Properties of thin films of tungsten sulfide and copper sulfide produced by magnetron sputtering method; Inorganic Materials: Applied Research; Vol. 8, iss. 1

Detalles Bibliográficos
Parent link:Inorganic Materials: Applied Research.— , 2010-
Vol. 8, iss. 1.— 2017.— [P. 166-171]
Autor principal: An V. V. Vladimir Vilorievich
Autores Corporativos: Национальный исследовательский Томский политехнический университет (ТПУ) Институт физики высоких технологий (ИФВТ) Кафедра общей химии и химической технологии (ОХХТ), Национальный исследовательский Томский политехнический университет (ТПУ) Институт физики высоких технологий (ИФВТ) Кафедра технологии силикатов и наноматериалов (ТСН)
Otros Autores: Pogrebenkov V. M. Valery Matveevich, Zakharov A. N. Aleksandr Nikolaevich
Sumario:Title screen
This article describes investigations into the properties of thin films of tungsten sulfide and copper sulfide produced by magnetron sputtering on glass substrates in argon atmosphere. Transmittance spectra of the obtained films are studied by spectrophotometry in the range from 300 to 900 nm; the band gaps are determined. The thickness of the obtained films varies in the range of 0.5-1 μm.
Режим доступа: по договору с организацией-держателем ресурса
Lenguaje:inglés
Publicado: 2017
Materias:
Acceso en línea:http://dx.doi.org/10.1134/S207511331701004X
Formato: Electrónico Capítulo de libro
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=654140
Descripción
Sumario:Title screen
This article describes investigations into the properties of thin films of tungsten sulfide and copper sulfide produced by magnetron sputtering on glass substrates in argon atmosphere. Transmittance spectra of the obtained films are studied by spectrophotometry in the range from 300 to 900 nm; the band gaps are determined. The thickness of the obtained films varies in the range of 0.5-1 μm.
Режим доступа: по договору с организацией-держателем ресурса
DOI:10.1134/S207511331701004X