Structural features of N-containing titanium dioxide thin films deposited by magnetron sputtering

Structural features of N-containing titanium dioxide thin films deposited by magnetron sputtering

Bibliographic Details
Parent link:	Thin Solid Films.— , 1967- Vol. 627.— 2017.— [P. 9–16]
Corporate Author:	Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Кафедра экспериментальной физики (ЭФ)
Other Authors:	Pustovalova A. A. Alla Aleksandrovna, Pichugin V. F. Vladimir Fyodorovich, Ivanova N. M. Nina Mikhailovna, Bruns M. P.
Summary:	Title screen N-containing titanium dioxide (N-TiO2) thin films have been obtained by the midrange magnetron sputtering with two-component N2/O2 reactive working gas. Complex analysis of the films structure and phase composition demonstrates its significant changes due to nitrogen content. X-ray diffraction data show the anatase-rutile phase transition and crystallites size reduction in N-TiO2 thin films with increase of nitrogen content in the reactive atmosphere. The investigation has been focused on phase transition, zeta potential, chemical bonds and UV-light influence on the wettability of the films versus nitrogen concentration. Hydrophilization of N-TiO2 films surface under UV-light has an irreversible character. Режим доступа: по договору с организацией-держателем ресурса
Published:	2017
Subjects:	электронный ресурс труды учёных ТПУ диоксид титана тонкие пленки магнетронное распыление
Online Access:	http://dx.doi.org/10.1016/j.tsf.2017.02.056
Format:	Electronic Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=653798

Internet

http://dx.doi.org/10.1016/j.tsf.2017.02.056