Investigation of deposition efficiency increase mechanisms using pulsed magnetron sputteringsystems with hot target; Plasma Physics and Technology Journal; Vol. 3, № 1
| Parent link: | Plasma Physics and Technology Journal Vol. 3, № 1.— 2016.— [P. 30] |
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| Συγγραφή απο Οργανισμό/Αρχή: | |
| Άλλοι συγγραφείς: | , , , |
| Περίληψη: | Title screen Pulsed Magnetron Sputtering Systems (PMSS) have profound interest because of the possibility to deposithigh-quality coating on the complex shape surface. However, these systems have a low deposition rate. If somestructural changes in the PMSS cooling system will be introduced, the evaporation of the material can beobtained in addition to sputtering. The main task of structural changes is heat transfer reducing from the target(hot-target MSS). Not many materials allow carrying out this process due to their thermophysical characteristics.The simulative description of thermal processes occurring on the target is presented in this work; the dependenceof the evaporation on the target surface temperature is provided. The most suitable metals were selected toreach a high-intensity emission of atoms. For these materials the dependences of the emission rate and targetsurface temperature on the magnetron discharge power are presented. The simulation results were confirmed byexperiments. |
| Γλώσσα: | Αγγλικά |
| Έκδοση: |
2016
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| Θέματα: | |
| Διαθέσιμο Online: | http://ppt.fel.cvut.cz/articles/2016/ppt-abstracts-3v1n.pdf#page=19 |
| Μορφή: | Ηλεκτρονική πηγή Κεφάλαιο βιβλίου |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=651859 |
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| 200 | 1 | |a Investigation of deposition efficiency increase mechanisms using pulsed magnetron sputteringsystems with hot target |f A. O. Borduleva [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 330 | |a Pulsed Magnetron Sputtering Systems (PMSS) have profound interest because of the possibility to deposithigh-quality coating on the complex shape surface. However, these systems have a low deposition rate. If somestructural changes in the PMSS cooling system will be introduced, the evaporation of the material can beobtained in addition to sputtering. The main task of structural changes is heat transfer reducing from the target(hot-target MSS). Not many materials allow carrying out this process due to their thermophysical characteristics.The simulative description of thermal processes occurring on the target is presented in this work; the dependenceof the evaporation on the target surface temperature is provided. The most suitable metals were selected toreach a high-intensity emission of atoms. For these materials the dependences of the emission rate and targetsurface temperature on the magnetron discharge power are presented. The simulation results were confirmed byexperiments. | ||
| 461 | |t Plasma Physics and Technology Journal | ||
| 463 | |t Vol. 3, № 1 |v [P. 30] |d 2016 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a осаждение | |
| 610 | 1 | |a магнетронные распылительные системы | |
| 610 | 1 | |a механизмы | |
| 701 | 1 | |a Borduleva |b A. O. |c specialist in the field of hydrogen energy |c engineer of Tomsk Polytechnic University |f 1992- |g Alena Olegovna |3 (RuTPU)RU\TPU\pers\36492 |9 19541 | |
| 701 | 1 | |a Bleykher (Bleicher) |b G. A. |c physicist |c Professor of Tomsk Polytechnic University, Doctor of Physical and Mathematical Sciences |f 1961- |g Galina Alekseevna |3 (RuTPU)RU\TPU\pers\31496 |9 15657 | |
| 701 | 1 | |a Sidelev |b D. V. |c physicist |c Associate Professor of Tomsk Polytechnic University, Candidate of Technical Sciences |f 1991- |g Dmitry Vladimirovich |y Tomsk |3 (RuTPU)RU\TPU\pers\34524 |9 17905 | |
| 701 | 1 | |a Krivobokov |b V. P. |c Russian physicist |c professor of Tomsk Polytechnic University (TPU), Doctor of Physical and Mathematical Sciences (DSc) |f 1948- |g Valery Pavlovich |3 (RuTPU)RU\TPU\pers\30416 |9 14757 | |
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