Investigation of deposition efficiency increase mechanisms using pulsed magnetron sputteringsystems with hot target
| Parent link: | Plasma Physics and Technology Journal Vol. 3, № 1.— 2016.— [P. 30] |
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| Other Authors: | , , , |
| Summary: | Title screen Pulsed Magnetron Sputtering Systems (PMSS) have profound interest because of the possibility to deposithigh-quality coating on the complex shape surface. However, these systems have a low deposition rate. If somestructural changes in the PMSS cooling system will be introduced, the evaporation of the material can beobtained in addition to sputtering. The main task of structural changes is heat transfer reducing from the target(hot-target MSS). Not many materials allow carrying out this process due to their thermophysical characteristics.The simulative description of thermal processes occurring on the target is presented in this work; the dependenceof the evaporation on the target surface temperature is provided. The most suitable metals were selected toreach a high-intensity emission of atoms. For these materials the dependences of the emission rate and targetsurface temperature on the magnetron discharge power are presented. The simulation results were confirmed byexperiments. |
| Published: |
2016
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| Subjects: | |
| Online Access: | http://ppt.fel.cvut.cz/articles/2016/ppt-abstracts-3v1n.pdf#page=19 |
| Format: | Electronic Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=651859 |