Effect of bias potential on the structure and distribution of elements in titanium-nitride coatings obtained by cathodic-arc deposition; Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques; Vol. 10, iss. 3
| Parent link: | Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques Vol. 10, iss. 3.— 2016.— [P. 282-291] |
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| Korporace: | , |
| Další autoři: | , , , , |
| Shrnutí: | Title screen It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma. Режим доступа: по договору с организацией-держателем ресурса |
| Jazyk: | angličtina |
| Vydáno: |
2016
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| Témata: | |
| On-line přístup: | http://dx.doi.org/10.1134/S1027451016030265 |
| Médium: | Elektronický zdroj Kapitola |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=650603 |
MARC
| LEADER | 00000naa0a2200000 4500 | ||
|---|---|---|---|
| 001 | 650603 | ||
| 005 | 20250314125940.0 | ||
| 035 | |a (RuTPU)RU\TPU\network\15821 | ||
| 090 | |a 650603 | ||
| 100 | |a 20161011d2016 k||y0rusy50 ba | ||
| 101 | 0 | |a eng | |
| 135 | |a drcn ---uucaa | ||
| 181 | 0 | |a i | |
| 182 | 0 | |a b | |
| 200 | 1 | |a Effect of bias potential on the structure and distribution of elements in titanium-nitride coatings obtained by cathodic-arc deposition |f E. B. Kashkarov [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: p. 651 (11 tit.)] | ||
| 330 | |a It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques | ||
| 463 | |t Vol. 10, iss. 3 |v [P. 282-291] |d 2016 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a нитрид титана | |
| 610 | 1 | |a потенциал смещения | |
| 610 | 1 | |a титановые покрытия | |
| 701 | 1 | |a Kashkarov |b E. B. |c Physicist |c Associate Professor, Researcher of Tomsk Polytechnic University, Candidate of Physical and Mathematical Sciences |f 1991- |g Egor Borisovich |3 (RuTPU)RU\TPU\pers\34949 |9 18267 | |
| 701 | 1 | |a Nikitenkov |b N. N. |c Russian physicist |c Professor of Tomsk Polytechnic University, Doctor of Physical and Mathematical Sciences |f 1953- |g Nikolai Nikolaevich |3 (RuTPU)RU\TPU\pers\30409 |9 14751 | |
| 701 | 1 | |a Syrtanov |b M. S. |c physicist |c Associate Professor, Researcher of Tomsk Polytechnic University, Candidate of Technical Sciences |f 1990- |g Maksim Sergeevich |3 (RuTPU)RU\TPU\pers\34764 |9 18114 | |
| 701 | 1 | |a Sutygina |b A. N. |c Physicist |c Technician of Tomsk Polytechnic University |f 1993- |g Alina Nikolaevna |3 (RuTPU)RU\TPU\pers\37677 |9 20482 | |
| 701 | 1 | |a Gvozdyakov |b D. V. |c specialist in the field of power engineering |c Associate Professor of Tomsk Polytechnic University, Candidate of technical sciences |f 1985- |g Dmitry Vasilievich |3 (RuTPU)RU\TPU\pers\35121 |9 18396 | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Физико-технический институт |b Кафедра общей физики |3 (RuTPU)RU\TPU\col\18734 |9 27183 |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Энергетический институт |b Кафедра атомных и тепловых электростанций |3 (RuTPU)RU\TPU\col\18683 |9 27136 |
| 801 | 2 | |a RU |b 63413507 |c 20170518 |g RCR | |
| 856 | 4 | |u http://dx.doi.org/10.1134/S1027451016030265 | |
| 942 | |c CF | ||