Effect of bias potential on the structure and distribution of elements in titanium-nitride coatings obtained by cathodic-arc deposition

Effect of bias potential on the structure and distribution of elements in titanium-nitride coatings obtained by cathodic-arc deposition

Bibliographic Details
Parent link:	Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques Vol. 10, iss. 3.— 2016.— [P. 282-291]
Corporate Authors:	Национальный исследовательский Томский политехнический университет Физико-технический институт Кафедра общей физики, Национальный исследовательский Томский политехнический университет Энергетический институт Кафедра атомных и тепловых электростанций
Other Authors:	Kashkarov E. B. Egor Borisovich, Nikitenkov N. N. Nikolai Nikolaevich, Syrtanov M. S. Maksim Sergeevich, Sutygina A. N. Alina Nikolaevna, Gvozdyakov D. V. Dmitry Vasilievich
Summary:	Title screen It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma. Режим доступа: по договору с организацией-держателем ресурса
Language:	English
Published:	2016
Subjects:	электронный ресурс труды учёных ТПУ нитрид титана потенциал смещения титановые покрытия
Online Access:	http://dx.doi.org/10.1134/S1027451016030265
Format:	Electronic Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=650603

Internet

http://dx.doi.org/10.1134/S1027451016030265