Evaporation factor in productivity increase of hot target magnetron sputtering systems; Vacuum; Vol. 132

Evaporation factor in productivity increase of hot target magnetron sputtering systems; Vacuum; Vol. 132

Bibliografiska uppgifter
Parent link:	Vacuum.— , 1951- Vol. 132.— 2016.— [P. 62-69]
Institutionell upphovsman:	Национальный исследовательский Томский политехнический университет Физико-технический институт
Övriga upphovsmän:	Bleykher (Bleicher) G. A. Galina Alekseevna, Borduleva A. O. Alena Olegovna, Krivobokov V. P. Valery Pavlovich, Sidelev D. V. Dmitry Vladimirovich
Sammanfattning:	Title screen The paper focuses on the investigation of thermal processes and erosion of hot solid Cr and Ti targets at the operation of power impulse magnetron sputtering systems (MSS). The role of evaporation and sublimation in the increase of atoms removal from targets with limited heat conduction has been clarified. For this purpose, mathematical simulation and experimental measurements of coatings deposition rate as well as optical emission spectra of discharge plasma were involved. Режим доступа: по договору с организацией-держателем ресурса
Språk:	engelska
Publicerad:	2016
Ämnen:	электронный ресурс труды учёных ТПУ титан хром испранение высокая мощность импульса
Länkar:	http://dx.doi.org/10.1016/j.vacuum.2016.07.030
Materialtyp:	Elektronisk Bokavsnitt
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=649854

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