Evaporation factor in productivity increase of hot target magnetron sputtering systems

Podrobná bibliografie
Parent link:Vacuum.— , 1951-
Vol. 132.— 2016.— [P. 62-69]
Korporativní autor: Национальный исследовательский Томский политехнический университет Физико-технический институт
Další autoři: Bleykher (Bleicher) G. A. Galina Alekseevna, Borduleva A. O. Alena Olegovna, Krivobokov V. P. Valery Pavlovich, Sidelev D. V. Dmitry Vladimirovich
Shrnutí:Title screen
The paper focuses on the investigation of thermal processes and erosion of hot solid Cr and Ti targets at the operation of power impulse magnetron sputtering systems (MSS). The role of evaporation and sublimation in the increase of atoms removal from targets with limited heat conduction has been clarified. For this purpose, mathematical simulation and experimental measurements of coatings deposition rate as well as optical emission spectra of discharge plasma were involved.
Режим доступа: по договору с организацией-держателем ресурса
Vydáno: 2016
Témata:
On-line přístup:http://dx.doi.org/10.1016/j.vacuum.2016.07.030
Médium: Elektronický zdroj Kapitola
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=649854
Popis
Shrnutí:Title screen
The paper focuses on the investigation of thermal processes and erosion of hot solid Cr and Ti targets at the operation of power impulse magnetron sputtering systems (MSS). The role of evaporation and sublimation in the increase of atoms removal from targets with limited heat conduction has been clarified. For this purpose, mathematical simulation and experimental measurements of coatings deposition rate as well as optical emission spectra of discharge plasma were involved.
Режим доступа: по договору с организацией-держателем ресурса
DOI:10.1016/j.vacuum.2016.07.030