Nitriding of VT1-0 titanium in low-pressure non-self-maintained glow discharge with the use of different gas mixtures

Бібліографічні деталі
Parent link:Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques.— , 2007-
Vol. 2, № 1.— 2008.— [P. 166-170]
Співавтор: Национальный исследовательский Томский политехнический университет (ТПУ)
Інші автори: Akhmadeev Y. K., Ivanov Yu. F. Yuriy Fedorovich, Koval N. N. Nikolay Nikolaevich, Lopatin I. V., Shchanin P. M.
Резюме:Title screen
The results of nitriding of VT1-0 titanium in the plasma of non-self-maintained glow discharge with a hollow cathode are presented. A nitriding process has been implemented in different gas mixtures at low pressure and temperatures less than 650°C. It is shown that two-hour nitriding in a helium-nitrogen mixture leads to formation of a nitrided layer on the specimen’s surface. The obtained layer hardness of 14.5 GPa exceeds the hardness corresponding to pure nitrogen and argon-nitrogen nitriding by a factor of 2 and 1.5, respectively.
Режим доступа: по договору с организацией-держателем ресурса
Мова:Англійська
Опубліковано: 2008
Предмети:
Онлайн доступ:http://link.springer.com/article/10.1007/s11700-008-1026-9
Формат: Електронний ресурс Частина з книги
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=649129