Structure and phase composition of a chromium–silicon system modified by high current electron beams
| Parent link: | Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques.— , 2007- Vol. 6, № 1.— 2012.— [P. 67-72] |
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| Other Authors: | , , , , , |
| Summary: | Title screen The results of studies of the structure-phase state of a chromium-coated silicon substrate system’s subsurface layer treated with low-energy high-current electron beams, 50–200 µs in duration and with an energy density of 15 J/cm2, are reported. The data of raster electron microscopy and X-ray structural and spectral microanalysis revealed the formation of a chromium-doped silicon layer with a thickness of 2–38 µm, chromium-enriched silicon dendrites, chromium disilicide CrSi2, and an amorphous eutectic layer (the characteristic cross-section size of the chromium-enriched phase extrusions is ~50 nm). The structure-phase transformations are discussed taking into account the peculiarities of the distribution of temperature, diffusion and convective mass-transfer in the modified layer. Режим доступа: по договору с организацией-держателем ресурса |
| Published: |
2012
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| Subjects: | |
| Online Access: | http://dx.doi.org/10.1134/S1027451012010193 |
| Format: | Electronic Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=649104 |