Nanocrystalline nitride coatings deposited by vacuum arc plasma-assisted method

Bibliographic Details
Parent link:Journal of Physics: Conference Series
Vol. 370 : 14th Latin American Workshop on Plasma Physics (LAWPP 2011), 20–25 November 2011, Mar del Plata, Argentina.— 2012.— [6 p.]
Corporate Author: Национальный исследовательский Томский политехнический университет (ТПУ)
Other Authors: Krysina O. V., Koval N. N. Nikolay Nikolaevich, Ivanov Yu. F. Yuriy Fedorovich, Timchenko N. A., Baumbach T., Doyle S., Slobodskyy T.
Summary:Title screen
In the given work, experiments on research of formation of titanium nitride doped with copper (≤12 at %) produced by plasma-assisted vacuum arc deposition by evaporation of sintered Ti-Cu cathodes were carried out. It was revealed that Ti-Cu-N coatings have high hardness (≈40 GPa), high elastic recovery (≥50%), low friction coefficient (˜≈0.2) and high adhesion to a substrate compared with typical TiN coatings. By methods of transmission electron microscopy of thin foils and x-ray diffraction, it was showed that the coating crystallites consist of d-TiN with the average crystallite size of 10-30 nm and the sheath of doping elements (copper) with thickness of 2-3 monolayers is formed around of TiN crystallites.
Режим доступа: по договору с организацией-держателем ресурса
Published: 2012
Subjects:
Online Access:http://dx.doi.org/10.1088/1742-6596/370/1/012021
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=649088