Aluminum films deposition by magnetron sputtering systems:Influence of target state and pulsing unit

书目详细资料
Parent link:	Optoelectronics, Photonics, Engineering and Nanostructures, OPEN 2016: Book of Abstracts 3rd International School and Conference, St Petersburg, Russia, March 28-30, 2016. [P. 571-572].— , 2016
其他作者:	Sidelev D. V. Dmitry Vladimirovich, Yuryeva A. V. Alena Victorovna, Krivobokov V. P. Valery Pavlovich, Shabunin A. S. Artem Sergeevich, Syrtanov M. S. Maksim Sergeevich, Koyshybaeva Zh. K. Zhanymgul Koyshybaykyzy
总结:	Title screen This article reports on technological possibilities of magnetron sputtering systemswith solid-state and liquid targets to deposition of Al films and its structure. There is shown acomparing of deposition rate of magnetron sputtering systems with direct current (DC), midfrequency(MF) and high power pulsed (HiPIMS) supplies. The dependence of plasmacomposition, films stricture and sputtering technique parameters is obtained.
语言:	英语
出版:	2016
主题:	электронный ресурс труды учёных ТПУ
在线阅读:	http://spbopen.spbau.com/PDF/Book_of_Abstracts_SPBOPEN_2016.pdf#page=571
格式:	电子本书章节
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=648815

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