Aluminum films deposition by magnetron sputtering systems:Influence of target state and pulsing unit

Bibliographische Detailangaben
Parent link:	Optoelectronics, Photonics, Engineering and Nanostructures, OPEN 2016: Book of Abstracts 3rd International School and Conference, St Petersburg, Russia, March 28-30, 2016. [P. 571-572].— , 2016
Weitere Verfasser:	Sidelev D. V. Dmitry Vladimirovich, Yuryeva A. V. Alena Victorovna, Krivobokov V. P. Valery Pavlovich, Shabunin A. S. Artem Sergeevich, Syrtanov M. S. Maksim Sergeevich, Koyshybaeva Zh. K. Zhanymgul Koyshybaykyzy
Zusammenfassung:	Title screen This article reports on technological possibilities of magnetron sputtering systemswith solid-state and liquid targets to deposition of Al films and its structure. There is shown acomparing of deposition rate of magnetron sputtering systems with direct current (DC), midfrequency(MF) and high power pulsed (HiPIMS) supplies. The dependence of plasmacomposition, films stricture and sputtering technique parameters is obtained.
Sprache:	Englisch
Veröffentlicht:	2016
Schlagworte:	электронный ресурс труды учёных ТПУ
Online-Zugang:	http://spbopen.spbau.com/PDF/Book_of_Abstracts_SPBOPEN_2016.pdf#page=571
Format:	Elektronisch Buchkapitel
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=648815

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